Ch2FCF3 Gas Flow Rate Effects of SiO2 Plasma Etching Rate on Quartz Crystal Microbalance
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چکیده
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ژورنال
عنوان ژورنال: Natural-B
سال: 2016
ISSN: 2088-4613,2088-4613
DOI: 10.21776/ub.natural-b.2016.003.04.1